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UHV Raman

Our group utilizes a UHV Raman system which allows us to grow, functionalize and spectroscopically characterize a wide array of materials in UHV conditions at lHe temperatures. The UHV system consists of preparation, analysis and storage chambers, LEED and  four laser lines (325nm, 488nm, 533nm and 633nm), which can be used to probe the Raman response and photoluminescence in-situ.